Facilities and Resources
The AMRI research laboratories are located in the Science Building at the University of New Orleans, where it occupies more than 10,000 square feet of office and laboratory space, including a 640 square foot Class 100 Clean Room, and has available an inventory of more than $9.5 million of specialized materials research instrumentation to carry out its research programs.
The majority of our research is conducted at our AMRI facilities by scientists and post-doctoral researchers who are developing and working on their research programs. Some components of the research are conducted in the laboratories of the participating universities, who are part of a research consortium established by AMRI through its research projects.
The majority of our research is conducted at our AMRI facilities by scientists and post-doctoral researchers who are developing and working on their research programs. Some components of the research are conducted in the laboratories of the participating universities, who are part of a research consortium established by AMRI through its research projects.
• Structural Characterization
• Sensor and Device Characterization
• Materials Synthesis
• Nanofabrication of Materials
• Patterning and Writing
• Nanoscale Component Fabrication
• Sensor Chip Assembly and Fabrication
• Transport Property Measurement for Sensor Chips
• Modeling and Simulation
• Nanodevice Processing Laboratory
• Other Resources
• Sensor and Device Characterization
• Materials Synthesis
• Nanofabrication of Materials
• Patterning and Writing
• Nanoscale Component Fabrication
• Sensor Chip Assembly and Fabrication
• Transport Property Measurement for Sensor Chips
• Modeling and Simulation
• Nanodevice Processing Laboratory
• Other Resources
Structural Characterization
• Transmission Electron Microscope (TEM), JEOL Model 2010 with energy dispersive X-ray spectrometer (EDS).
• Scanning Electron Microscope (SEM), JEOL Model 5410 with energy dispersive X-ray spectrometer (EDS).
• Field Emission Scanning Electron Microscope (FESEM), Model LEO 1530VP, variable pressure FESEM with EDS.
• Asylum Research Atomic Force Microscope/Magnetic Force Microscope equipped for piezoelectric measurements.
• Princeton Instruments Trivista triple spectrometer (Raman, FTIR, Photoluminescence).
• Pananalytical Thin film/Small Angle X-Ray Diffraction (SAXS).
• Digital Instruments NanoScope Multimode Scanning Probe Microscope with combined atomic force microscopy, magnetic force microscopy and scanning tunneling microscopy.
• VEECO Scanning probe microscope.
• Philips X’Pert X-ray powder diffractometer.
• BX51TRF Microscope frame w/o TL arm w/2 sockets for patterning and wafer checking.
• DEC Alpha Workstation for EM image simulation, processing and storage.
Sensor and Device Characterization
• Magneto-optical characterization equipment: Oxford Instruments superconducting magnet with optical access both parallel and perpendicular to the magnetic field. The system is capable of producing fields up to 7 T and the sample temperature can be set anywhere from 2 K to 300 K (-456°F to 80°F). A spectroscopic light source provides monochromatic light in the spectral range from 200 nm to 1800 nm for reflection and transmission measurements. Additionally, an Argon ion laser is available as an excitation source for photoluminescence measurements.
• Ocean Optics Fiber UV-Vis Spectrometer
• Thermo Nicolet NEXUS 670 FT-IR spectophotometer.
• Keithley Model 2001 Digital Multimeter, Model 2400 Source Meter and Model 2182 Nanovoltmeter for precision I-V and tunneling current measurements.
• Quantum Design Physical Properties Measurement System (PPMS) with 9 T and 14 T magnet and 1.9K to 350K temperature range for Options included: AC/DC magnetometer, AC transport, Torque magnetometer, Electro-transport, Thermo-Electric.
• Quantum Design MPMS-5S SQUID Susceptometer with 5.5 T magnet, 1.7K to 400K temperature range and AC and DC capabilities.
• Quantum Design MPMS-7XL SQUID Susceptometer with 7.0 T magnet, 1.7K to 1000K temperature range and transverse measurement capabilities.
• High temperature Hall effect measurement system with Lakeshore 370 AC Resistance Bridge
• Ferromagnetic Resonance (FMR) and Electron Paramagnetic Resonance (EPR) Spectrometer System, Bruker EMX 10/12. Options included: X-band (9.8 GHz), Q-band (35GHz), low temperature X-band (2 K-300 K), low temperature Q-band (2 K-300 K).
• Agilent Vector Network Analyzer HP 8722ES, covering frequencies from 50 MHz to 40 GHz. Options included: Time Domain Capability, High Stability Frequency Reference, Materials Measurement Software, and Fourth Sampler and TRL calibration. Various broadband, microstrip and waveguide test fixtures are available for our network analyzer.
• Cascade Microtech Complete RF Measurement Package, including probe station (Summit 9101 Analytical Probe Station), microscope (Leica S6E StereoZoom microscope kit), Infinity Microwave and RF probes, cables, positioners, calibration software, and accessories.
• Agilent Impedance/Material Analyzer HP4291B frequency range (1 MHz to 1.8 GHz with 10-3 Hz resolution). High Q accuracy enables low-loss component analysis.
• Agilent LCR meter HP4284A with dielectric test fixture (20 HZ – 1 MHz).
• Vector Vibrating Sample Magnetometer from Lakeshore: 0-1T magnetic field range, 4K-1273K temperature range. Options: Vector option (Y coils set), cryostat, oven, low field (Helmholtz coil set).
• Ferroelectric tester (already bought; Radiant Technologies) for measuring ferroelectric and piezoelectric material.
• TA Instruments - Thermal Analysis (DSC/TGA/DTA) System.
Materials Synthesis
• MBraun Drybox.
• Two Schlenk Lines.
• Shimadzu Gas chromatograph/Mass Spectrometer.
• Crystal Systems Corporation, Four-mirror optical floating zone furnace.
• Five inert atmosphere glove boxes with air purification system.
• One six port vacuum line for oxygen-free synthesis.
• Two high temperature box furnaces (Lindberg/Blue M, Tmax = 1100 °C).
• One high temperature tube furnaces (Lindberg/Blue M, Tmax = 1200 °C).
• Two high temperature tube furnaces (Applied Test Systems; Tmax = 1100 °C).
• Four balances.
• Two laboratory dry ovens.
• Hot Press, Thermal Technology Inc. Model HP20-4560-20.
Nanofabrication of Materials
• EG&G VMP2Z multichannel potentiostat and a Princeton 273A Potentiostat/Galvanostat for electrodeposition.
• Pulsed Laser Ablation Deposition System, a Pulsed Excimer-500 Laser (Lumonics Co.) operating at the wavelengths range from 155 to 780 nm.
• APX Scientific Microlayer 400 sputtering systems (10-10 Torr range) with six 3? magnetron guns which are in co-deposition configuration and can be operated in DC or RF modes. The system has a potential of producing even very complex nanowires structures.
• Four Glove box Systems (Model VAC100029) for catalyst fabrication.
• Furnaces: Eight Lindberg/Blue M box furnaces (1100°C max.) and ten Lindberg/Blue M tube furnaces (1100°C max.) most with programmable controllers; two Thermolyne tube furnaces (1200°C max.) with single set point controllers. Two vacuum ovens, one high temperature (1500°C max.) box furnace and one high temperature (1500°C max.) tube furnace.
• NAPCO 2028R Multi-Functional Centrifuge.
• Controlled atmosphere dryboxes: MBRaun two-person dry box with moisture and oxygen sensors, hydraulic press, and video microscope. Several VAC Atmospheres argon-filled drybox, one fitted with an Illinois Instruments oxygen sensor.
• Controlled atmosphere dryboxes: MBRaun two-person dry box with moisture and oxygen sensors, hydraulic press, and video microscope. Several VAC Atmospheres argon-filled drybox, one fitted with an Illinois Instruments oxygen sensor.
• High vacuum line for sealing glass tubes for annealing and synthesis.
• RPR-200 Rayonet UV Reactor System.
Patterning and Writing
• JC Nabity Lithography Systems incorporated with LEO 1530 Field Emission Scanning Microscope for e-beam nanowriting and nanopatterning.
• 6708 Spin Coater with programmable logical control to store and execute operator-selectable spin coat profile.
• LG-B 100B Mechanical Convention Ovens for ideal general drying, conditioning, desiccating, annealing, moisture testing, aging, and test.
• CRESSINTON 308R Vacuum sputter and evaporator with thickness control.
• Denton Desk II cold sputter/etch unit and carbon evaporation accessory.
Nanoscale Component Fabrication
• Four Glove Box Systems (Model VAC100029) for nanoparticle fabrication.
• Furnaces: Eight Lindberg Tube Furnaces box furnaces (1100°C) and ten Lindberg/Blue M tube furnaces (1100°C) max. One high temperature furnace (1600°C).
• Pulsed laser deposition system. The neodymium-doped yttrium aluminum garnet (Nd:YAG) laser was used to evaporate the target materials. The laser wavelength, energy density, and pulse frequency were 266 nm, 2 J/cm2, and 2 Hz, respectively.
• Chemical Vapor Deposition (CVD) system for nanowire synthesis.
• EG&VMP2Z multichannel potentiostat and a Princeton 273A Potentiostat /Galvanostat for electrodeposition.
• NaPCO 2028R Muti-Functional Centrifuge.
• Controlled atmosphere dryboxes: MBRaun two-person dry box with moisture and oxygen sensors, hydraulic press, and video microscope.
• RPR-200 Rayonet UV Reactor System.
Sensor Chip Assembly and Fabrication
• UV light pattern generator for photolithography.
• JC Nabity Lithography Systems incorporated with LEO 1530 Field Emission Scanning Microscope for e-beam nanowriting and nanopatterning.
• KSV 5000 Langmuir-Blodgett (LB) Alignment Equipment with computer control for surface tension measurement.
• 6708 Spin Coater with programmable logical control to store and execute operator-selectable spin coat profile.
• LG-B 100B Mechanical Convention Ovens for ideal general drying, conditioning, desiccating, annealing, moisture testing, aging, and testing.
• 308 EM Vacuum evaporator with thickness control.
• Kleindiek Nanomanipulator System with four nanomanipulators, microgripper and microinjections.
Transport Property Measurement for Sensor Chips
• Keithley 6585 Picoammeter for current measurement.
• Quantum Design Physical Properties Measurement System (PPMS) with 9T magnet and 1.9K to 350K temperature range for transportation, tunneling effect and Hall effect, etc.
• Kleindiek Nanomanipulator System with in-situ transportation measurement.
• Quantum Design Physical Properties Measurement System (PPMS) (transport, magnetostriction, magnetic, thermo-electric, and anisotropy measurements,); wide range of temperature (2 K-400 K) and magnetic field (0 T-14 T). Options included: AC/DC magnetometer, AC transport, Torque magnetometer, Electro-transport, Thermo-Electric.
Modeling and Simulation
• AMRI researchers are a part of the Louisiana Optical Network Initiative, or LONI, which is a state-of-the-art, fiber optics network that runs throughout Louisiana, and connects Louisiana and Mississippi research universities to one another as well as National LambdaRail and Internet2. LONI provides Louisiana researchers with one of the most advanced optical networks in the country and the most powerful distributed supercomputer resources available to any academic community with over 85 teraflops of computational capacity.
• Hardware includes a 14-node, 112-processor, IBM P5-575 system and a 128-node, 512-core Dell Xeon supercomputer which are installed in the University Computing and Communications Center, and are part of the Louisiana Optical Network (LONI).
Nanodevice Processing Laboratory
• Clean Room Facility (“Class 100”). This facility was developed to provide research support for AMRI and collaborating institutions with the cleanroom facilities and technology to do competitive research in the field of nanofabrication. The evaluation of the purity of the air is based on number of dust particles in a unit volume. Due to this design the air is filtered several times before leaving the cleanroom and the number of particles present in the unit volume dropped to below 100, which elevates the rank of the cleanroom to “Class 100”. Specialized equipment in the clean room includes:
• Four vertical flow benches.
• Particle monitoring system.
• Spin-coater/hot plate (Coat-bake) system, Model CEE 200CB.
• Mask aligner/UV exposure station.
• Milling system, Orion-8-IM.
Other Resources
• Other smaller equipment items also are available to AMRI researchers. These include arc induction furnaces, tube furnaces, Schlenck and high vacuum lines, three VAC atmosphere controlled glove boxes for wet and dry chemical synthesis, and a variety of wet chemistry laboratory equipment. The Chemistry Department at UNO manages a large instrumentation facility that houses state-of-the-art NMR spectrometers (300, 400, and 500 MHz), mass spectrometers (4 units, including Tandem MS and MALDI MS), and UV-Vis-IR spectrometers, which also are available to AMRI researchers. Also available to our researchers through the College of Sciences are a machine shop, an electronics shop, and a glass shop for use as needed on our projects.
• Transmission Electron Microscope (TEM), JEOL Model 2010 with energy dispersive X-ray spectrometer (EDS).
• Scanning Electron Microscope (SEM), JEOL Model 5410 with energy dispersive X-ray spectrometer (EDS).
• Field Emission Scanning Electron Microscope (FESEM), Model LEO 1530VP, variable pressure FESEM with EDS.
• Asylum Research Atomic Force Microscope/Magnetic Force Microscope equipped for piezoelectric measurements.
• Princeton Instruments Trivista triple spectrometer (Raman, FTIR, Photoluminescence).
• Pananalytical Thin film/Small Angle X-Ray Diffraction (SAXS).
• Digital Instruments NanoScope Multimode Scanning Probe Microscope with combined atomic force microscopy, magnetic force microscopy and scanning tunneling microscopy.
• VEECO Scanning probe microscope.
• Philips X’Pert X-ray powder diffractometer.
• BX51TRF Microscope frame w/o TL arm w/2 sockets for patterning and wafer checking.
• DEC Alpha Workstation for EM image simulation, processing and storage.
Sensor and Device Characterization
• Magneto-optical characterization equipment: Oxford Instruments superconducting magnet with optical access both parallel and perpendicular to the magnetic field. The system is capable of producing fields up to 7 T and the sample temperature can be set anywhere from 2 K to 300 K (-456°F to 80°F). A spectroscopic light source provides monochromatic light in the spectral range from 200 nm to 1800 nm for reflection and transmission measurements. Additionally, an Argon ion laser is available as an excitation source for photoluminescence measurements.
• Ocean Optics Fiber UV-Vis Spectrometer
• Thermo Nicolet NEXUS 670 FT-IR spectophotometer.
• Keithley Model 2001 Digital Multimeter, Model 2400 Source Meter and Model 2182 Nanovoltmeter for precision I-V and tunneling current measurements.
• Quantum Design Physical Properties Measurement System (PPMS) with 9 T and 14 T magnet and 1.9K to 350K temperature range for Options included: AC/DC magnetometer, AC transport, Torque magnetometer, Electro-transport, Thermo-Electric.
• Quantum Design MPMS-5S SQUID Susceptometer with 5.5 T magnet, 1.7K to 400K temperature range and AC and DC capabilities.
• Quantum Design MPMS-7XL SQUID Susceptometer with 7.0 T magnet, 1.7K to 1000K temperature range and transverse measurement capabilities.
• High temperature Hall effect measurement system with Lakeshore 370 AC Resistance Bridge
• Ferromagnetic Resonance (FMR) and Electron Paramagnetic Resonance (EPR) Spectrometer System, Bruker EMX 10/12. Options included: X-band (9.8 GHz), Q-band (35GHz), low temperature X-band (2 K-300 K), low temperature Q-band (2 K-300 K).
• Agilent Vector Network Analyzer HP 8722ES, covering frequencies from 50 MHz to 40 GHz. Options included: Time Domain Capability, High Stability Frequency Reference, Materials Measurement Software, and Fourth Sampler and TRL calibration. Various broadband, microstrip and waveguide test fixtures are available for our network analyzer.
• Cascade Microtech Complete RF Measurement Package, including probe station (Summit 9101 Analytical Probe Station), microscope (Leica S6E StereoZoom microscope kit), Infinity Microwave and RF probes, cables, positioners, calibration software, and accessories.
• Agilent Impedance/Material Analyzer HP4291B frequency range (1 MHz to 1.8 GHz with 10-3 Hz resolution). High Q accuracy enables low-loss component analysis.
• Agilent LCR meter HP4284A with dielectric test fixture (20 HZ – 1 MHz).
• Vector Vibrating Sample Magnetometer from Lakeshore: 0-1T magnetic field range, 4K-1273K temperature range. Options: Vector option (Y coils set), cryostat, oven, low field (Helmholtz coil set).
• Ferroelectric tester (already bought; Radiant Technologies) for measuring ferroelectric and piezoelectric material.
• TA Instruments - Thermal Analysis (DSC/TGA/DTA) System.
Materials Synthesis
• MBraun Drybox.
• Two Schlenk Lines.
• Shimadzu Gas chromatograph/Mass Spectrometer.
• Crystal Systems Corporation, Four-mirror optical floating zone furnace.
• Five inert atmosphere glove boxes with air purification system.
• One six port vacuum line for oxygen-free synthesis.
• Two high temperature box furnaces (Lindberg/Blue M, Tmax = 1100 °C).
• One high temperature tube furnaces (Lindberg/Blue M, Tmax = 1200 °C).
• Two high temperature tube furnaces (Applied Test Systems; Tmax = 1100 °C).
• Four balances.
• Two laboratory dry ovens.
• Hot Press, Thermal Technology Inc. Model HP20-4560-20.
Nanofabrication of Materials
• EG&G VMP2Z multichannel potentiostat and a Princeton 273A Potentiostat/Galvanostat for electrodeposition.
• Pulsed Laser Ablation Deposition System, a Pulsed Excimer-500 Laser (Lumonics Co.) operating at the wavelengths range from 155 to 780 nm.
• APX Scientific Microlayer 400 sputtering systems (10-10 Torr range) with six 3? magnetron guns which are in co-deposition configuration and can be operated in DC or RF modes. The system has a potential of producing even very complex nanowires structures.
• Four Glove box Systems (Model VAC100029) for catalyst fabrication.
• Furnaces: Eight Lindberg/Blue M box furnaces (1100°C max.) and ten Lindberg/Blue M tube furnaces (1100°C max.) most with programmable controllers; two Thermolyne tube furnaces (1200°C max.) with single set point controllers. Two vacuum ovens, one high temperature (1500°C max.) box furnace and one high temperature (1500°C max.) tube furnace.
• NAPCO 2028R Multi-Functional Centrifuge.
• Controlled atmosphere dryboxes: MBRaun two-person dry box with moisture and oxygen sensors, hydraulic press, and video microscope. Several VAC Atmospheres argon-filled drybox, one fitted with an Illinois Instruments oxygen sensor.
• Controlled atmosphere dryboxes: MBRaun two-person dry box with moisture and oxygen sensors, hydraulic press, and video microscope. Several VAC Atmospheres argon-filled drybox, one fitted with an Illinois Instruments oxygen sensor.
• High vacuum line for sealing glass tubes for annealing and synthesis.
• RPR-200 Rayonet UV Reactor System.
Patterning and Writing
• JC Nabity Lithography Systems incorporated with LEO 1530 Field Emission Scanning Microscope for e-beam nanowriting and nanopatterning.
• 6708 Spin Coater with programmable logical control to store and execute operator-selectable spin coat profile.
• LG-B 100B Mechanical Convention Ovens for ideal general drying, conditioning, desiccating, annealing, moisture testing, aging, and test.
• CRESSINTON 308R Vacuum sputter and evaporator with thickness control.
• Denton Desk II cold sputter/etch unit and carbon evaporation accessory.
Nanoscale Component Fabrication
• Four Glove Box Systems (Model VAC100029) for nanoparticle fabrication.
• Furnaces: Eight Lindberg Tube Furnaces box furnaces (1100°C) and ten Lindberg/Blue M tube furnaces (1100°C) max. One high temperature furnace (1600°C).
• Pulsed laser deposition system. The neodymium-doped yttrium aluminum garnet (Nd:YAG) laser was used to evaporate the target materials. The laser wavelength, energy density, and pulse frequency were 266 nm, 2 J/cm2, and 2 Hz, respectively.
• Chemical Vapor Deposition (CVD) system for nanowire synthesis.
• EG&VMP2Z multichannel potentiostat and a Princeton 273A Potentiostat /Galvanostat for electrodeposition.
• NaPCO 2028R Muti-Functional Centrifuge.
• Controlled atmosphere dryboxes: MBRaun two-person dry box with moisture and oxygen sensors, hydraulic press, and video microscope.
• RPR-200 Rayonet UV Reactor System.
Sensor Chip Assembly and Fabrication
• UV light pattern generator for photolithography.
• JC Nabity Lithography Systems incorporated with LEO 1530 Field Emission Scanning Microscope for e-beam nanowriting and nanopatterning.
• KSV 5000 Langmuir-Blodgett (LB) Alignment Equipment with computer control for surface tension measurement.
• 6708 Spin Coater with programmable logical control to store and execute operator-selectable spin coat profile.
• LG-B 100B Mechanical Convention Ovens for ideal general drying, conditioning, desiccating, annealing, moisture testing, aging, and testing.
• 308 EM Vacuum evaporator with thickness control.
• Kleindiek Nanomanipulator System with four nanomanipulators, microgripper and microinjections.
Transport Property Measurement for Sensor Chips
• Keithley 6585 Picoammeter for current measurement.
• Quantum Design Physical Properties Measurement System (PPMS) with 9T magnet and 1.9K to 350K temperature range for transportation, tunneling effect and Hall effect, etc.
• Kleindiek Nanomanipulator System with in-situ transportation measurement.
• Quantum Design Physical Properties Measurement System (PPMS) (transport, magnetostriction, magnetic, thermo-electric, and anisotropy measurements,); wide range of temperature (2 K-400 K) and magnetic field (0 T-14 T). Options included: AC/DC magnetometer, AC transport, Torque magnetometer, Electro-transport, Thermo-Electric.
Modeling and Simulation
• AMRI researchers are a part of the Louisiana Optical Network Initiative, or LONI, which is a state-of-the-art, fiber optics network that runs throughout Louisiana, and connects Louisiana and Mississippi research universities to one another as well as National LambdaRail and Internet2. LONI provides Louisiana researchers with one of the most advanced optical networks in the country and the most powerful distributed supercomputer resources available to any academic community with over 85 teraflops of computational capacity.
• Hardware includes a 14-node, 112-processor, IBM P5-575 system and a 128-node, 512-core Dell Xeon supercomputer which are installed in the University Computing and Communications Center, and are part of the Louisiana Optical Network (LONI).
Nanodevice Processing Laboratory
• Clean Room Facility (“Class 100”). This facility was developed to provide research support for AMRI and collaborating institutions with the cleanroom facilities and technology to do competitive research in the field of nanofabrication. The evaluation of the purity of the air is based on number of dust particles in a unit volume. Due to this design the air is filtered several times before leaving the cleanroom and the number of particles present in the unit volume dropped to below 100, which elevates the rank of the cleanroom to “Class 100”. Specialized equipment in the clean room includes:
• Four vertical flow benches.
• Particle monitoring system.
• Spin-coater/hot plate (Coat-bake) system, Model CEE 200CB.
• Mask aligner/UV exposure station.
• Milling system, Orion-8-IM.
Other Resources
• Other smaller equipment items also are available to AMRI researchers. These include arc induction furnaces, tube furnaces, Schlenck and high vacuum lines, three VAC atmosphere controlled glove boxes for wet and dry chemical synthesis, and a variety of wet chemistry laboratory equipment. The Chemistry Department at UNO manages a large instrumentation facility that houses state-of-the-art NMR spectrometers (300, 400, and 500 MHz), mass spectrometers (4 units, including Tandem MS and MALDI MS), and UV-Vis-IR spectrometers, which also are available to AMRI researchers. Also available to our researchers through the College of Sciences are a machine shop, an electronics shop, and a glass shop for use as needed on our projects.
| Advanced Materials Research Institute - College of Sciences University of New Orleans 2000 Lakeshore Drive Science Building New Orleans, LA 70148 | Copyright © 2009 University of New Orleans |
| Phone: 504.280.6840 || Fax:504.280.3185 | Last modified 07/28/2010 |
| E-mail: amri@uno.edu | Designed By Sandeep Mambers |
