AMRI's Electron Microscopy Laboratory Facilities

Energy Dispersive X-ray Spectroscopy (EDS)

Scanning Probe Microscope

Sample Preparation Facility

Dark Room Facility

Image Processing Facility
  • Microtek ScanMaker 5
  • Codonics Photographic Printer

 


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JEOL 2010 Transmission Electron Microscope

The JEOL 2010 transmission electron microscope is a multipurpose high-resolution analytical electron microscope with a wide range of capabilities such as high-resolution image observation with 0.23 nm point resolution and 0.14 lattice image, EDS (Energy dispersive X-ray spectrometry) for element analysis, and versatile analysis by electron diffraction. The magnification goes from x1,500 to 1,200,000.

Features:

  • Maximum accelerating voltage: 200kV
  • Point resolution: 0.23 nm
  • Magnification: x1,500-1,200,000
  • Double tilt holder with tilt angle: ± 30°
  • Double tilt high temperature holder: ~ 1000° C

 

Accessories:

  • Scanning image observation device
  • EDS Microanalysis and digital imaging system

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JSM 5410 Scanning Electron Microscope

The JSM-5410 scanning electron microscope is a high-performance multipurpose SEM with a high-resolution of 3.5 nm, and EDS (energy dispersive X-ray spectrometer). It is automated features included Auto Focus/Auto Stigmator, and Automatic Contrast and Brightness. The EDS makes the JSM-5410 expandable from morphological observation to multi-purpose high-resolution elemental analysis.

Features:

  • Resolution: 3.5 nm (at 30kV, WD=8 nm)
  • Accelerating Voltage:0.5kV to 3kV in 0.1kV steps, 4kV to 30kV in 5kV steps
  • Magnification Range: 15x to 200,000x (25 steps)

Accessories:

Backscatter Electron Detector

EDS Microanalysis System (DX PRIME)

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LEO 1530 Variable Pressure Field Emission Scanning Electron Microscope

The LEO 1530VP represents the absolute pinnacle of high performance and flexibility in specimen handing. With the unique combination of GEMINI ultra-high performance electron optics and LEO’s variable pressure technology, the LEO 1530VP delivers truly outstanding capabilities in a range of application. The chamber pressure can be set to any value in the pressure range to suit the specimen, and optimum secondary electron imaging is always available: in lens detection at high vacuum, patented VPSE setection in VP mode. With the ability also to allow X-ray analysis on completely insulating specimens, the LEO 1530VP is perfect in applications such as semiconductor FA, life science, geology, archaeology, composite materials and many more.

Features:

  • Ultra-high resolution in high vacuum – 1 nm at 20 kV, 2.5nm at 1 kV, in lense detection
  • Ultra-high resolution in VP mode - 2nm at 30 kV, VPSE detection
  • Imaging and analysis of non-noconducting materials
  • SE imaging in all models. BSD, EDS, EBSD also available
  • Point and click vacuum pressure selection

Accessory:

  • AZTEC Embedded EDS system for LEO SEMs
  • 4 Quadrant Solid state BSD detector

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Energy Dispersive X-ray Spectroscopy (EDS)

EDAX DX Prime EDS System for JEOL 5410 Microscope


Features:

  • Super ultra thin window detector
  • Qualitative microanalysis software
  • Digital imaging package

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EDAX DX Prime EDS System for JEOL 2010 Micrsocpe

Features:

  • Qualitative microanalysis software
  • Quantitative thin film TEM microanalysis software for materials application
  • Imaging software
  • DXF LIGHT Simulation software
  • SUTW Retractable TEM detector

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AZTEC EDS System Embedded with LEO Microscope

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Scanning Probe Microscope

Digital Instruments Model MultiMode

Features:
  • Scanning Tunneling Microscopy
  • Atomic Force Microscopy
    1. Contact Mode AFM
    2. Non-contact Mode AFM
    3. Tapping Mode AFM
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Denton DESK II Sputtering Machine

The Denton Vacuum DESK II Cold/ Etch Unit is designed to clean the surface of SEM specimens and to deposit heavy metal conductive coating on the clean surface. A standard 6" diameter Pyrex cylinder with top and bottom gaskets sits on an aluminum baseplate. The cylinder is evacuated by a cfm, two-stage direct-drive mechanic pump mounted within the cabinet. The sputter cathode (gold is standard) is clamped to an insulated aluminum plate in the chamber cover. The cabinet contains a DC power supply rated 0-1200V, 0-50 milliamps. High voltage is available only when the sputter chamber pressure is less than one torr.

Features:

  • Etching
  • Sputtering

Accessory:

  • Carbon Rod Evaporation Accessory
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Sample Preparation Facility

 

Gatan 691 Precision Ion Polishing System (PIPS)

Gatan Model 691 Precision Ion Polishing System (PIPS) is a completely self-contained, compact, bench-top system designed to produce high quality TEM specimen with exceptionally large, clean, electron-transparent areas.

Features:
  • Specimen viewing
  • Shutter control
  • Liquid nitrogen trap
  • Ion gun Purging
  • Ion-beam Modulation
  • End-point Detection
  • Digital Process timer
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Gatan 656 Dimple Grinder

Features:
  • The thickness measurement
  • The alarm for Automatic stopper
  • The weight adjustment
  • Free dimpling speed control for the grinding wheels
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Gatan 623 Specimen Mounting Hot Plate

Features:
  • T < 130° C
  • Stubs seating base

 

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Ultrasonic Cleaner (Branson)

Features:
  • 60 W
  • Time controller

 

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Buehler 1000 Precision Saw

Features:

  • Free speed change
  • Universal sample holding kit

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Lapping machine

Features:

Free speed control

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Dark Room Facility

Fujimoto 4x5" Enlarger 450M-C

Features:

Lenses

Exposure Time controller

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Devappa 16" Print Dryer

Features:

Maximum size of paper: 16"x24"


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